設備名稱 Equipment Name
管式A&P設備 Horizontal PEALD (A&P)
設備型號 Equipment Model
PD-520L/PD-520MAX
設備用途 Equipment Application
AlO+SiN薄膜沉積。
AlO+SiN Thin-film Deposition.
技術特點 Features
1、原子層沉積工藝特性,成膜均勻性好。
Atomic layer deposition process, with better film uniformity.
2、同機臺或同管完成多層膜沉積,減少工藝環(huán)節(jié),有效提升良率、降低碎片率。
Multi-layer thin film deposited in the same process equipment or same furnace tube, reducing process steps and wafer breakage rate, improving yield effectively.
3、自主研發(fā)液態(tài)源前驅(qū)體蒸氣輸送與前驅(qū)體快速切換技術。
Independent R&D of liquid source precursor vapor delivery and precursor rapid switching technology.
4、適應不同前驅(qū)體、不同材料鈍化層沉積,工藝拓展空間大。
Suitable for deposition of passivation layer for different precursors and materials, with a large space for process expansion.
設備參數(shù) Parameters