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        管式A&P設(shè)備

        管式A&P設(shè)備

        AlO+SiN薄膜沉積。


        設(shè)備名稱 Equipment Name

        管式A&P設(shè)備  Horizontal PEALD (A&P)

        設(shè)備型號(hào) Equipment Model

        PD-520L/PD-520MAX

        設(shè)備用途 Equipment Application

        AlO+SiN薄膜沉積。
        AlO+SiN Thin-film Deposition.


        技術(shù)特點(diǎn)  Features

        1、原子層沉積工藝特性,成膜均勻性好。

        Atomic layer deposition process, with better film uniformity.

        2、同機(jī)臺(tái)或同管完成多層膜沉積,減少工藝環(huán)節(jié),有效提升良率、降低碎片率。
        Multi-layer thin film deposited in the same process equipment or same furnace tube, reducing process steps and wafer breakage rate, improving yield effectively.

        3、自主研發(fā)液態(tài)源前驅(qū)體蒸氣輸送與前驅(qū)體快速切換技術(shù)。
        Independent R&D of liquid source precursor vapor delivery and precursor rapid switching technology.

        4、適應(yīng)不同前驅(qū)體、不同材料鈍化層沉積,工藝拓展空間大。
        Suitable for deposition of passivation layer for different precursors and materials, with a large space for process expansion.


        設(shè)備參數(shù)  Parameters

        国产亚洲91手机在线视频_国产一区二区三区污污_97超巨香蕉人妻在线点播欧美_亚洲综合无码精品视频
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